Semiconductor integrated circuit
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorHiroshi Matsuoka
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Abstract
A semiconductor integrated circuit device includes a plurality of transistors each comprising a source region, a drain region, and a gate region, the source regions of the transistors are commonly connected to each other via via-holes produced through the semiconductor substrate at positions corresponding to the source regions, the gate regions of the transistors are commonly connected to each other on the semiconductor substrate, and the via-holes of the semiconductor substrate are arranged dispersively in two-dimensional direction in the surface of the semiconductor substrate.
Claims3
A semiconductor integrated circuit device comprising:
- a semiconductor substrate containing via-holes;
- a plurality of transistors, each including a source region and a drain region disposed on said semiconductor substrate and a gate region disposed between said source region and said drain region wherein the via-holes are disposed in said substrate at said source regions, said source regions of said transistors are commonly connected to each other through the via-holes , said gate and drain regions of said transistors are respectively commonly connected to each other on said semiconductor substrate, the via-holes in said semiconductor substrate are arranged in two dimensions in said semiconductor substrate, each of the via-holes lies along one of first and second generally parallel straight lines, and each pair of via-holes, consisting of one via-hole lying along the first line and one via-hole lying along the second line, lies on a straight line that is oblique to the first and second lines.
Dependencies are inferred from the claim text.