Method of measuring FET noise parameters
AssigneeHughes Aircraft Company
InventorsMadhu S. Gupta, Paul T. Greiling, Steven E. Rosenbaum, Octavius Pitzalis
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AssigneeHughes Aircraft Company
InventorsMadhu S. Gupta, Paul T. Greiling, Steven E. Rosenbaum, Octavius Pitzalis
Estimating the term…
A method is described for measuring the noise parameters of field effect transistors (FETs) while still in the wafer stage. Instead of conducting lengthy testing of each individual device at the operating frequency of interest after the devices have been diced, mounted and bonded, each of the devices on a wafer is automatically probed to obtain the standard S-parameters and also the FET's output noise power P.sub.n at a frequency at which parasitic probe effects are avoided. The various noise parameters can then be calculated for higher operating frequencies of interest from FET equivalent circuit parameters derived from the S-parameters, and from P.sub.n, either before or after dicing.
A method of determining a noise parameter of a field effect transistor (FET) formed on a single wafer with a plurality of other FETs, comprising:
A method of determining a noise parameter of a field effect transistor (FET), comprising:
A method of determining the minimum noise figure F.sub.min of a field effect transistor (FET) which is connected in a circuit having a conductance G.sub.c, comprising:
A method of determining the minimum noise figure F.sub.min of a field effect transistor (FET) which is connected in a circuit having a conductance G.sub.c, comprising:
A method of determining the minimum noise figure F.sub.min of a field effect transistor (FET) which is connected in an embedding circuit having a conductance G.sub.c, comprising:
Dependencies are inferred from the claim text.