Process and apparatus for determining thicknesses of layers
AssigneeAkzo N.V.
InventorGerrit C. Dubbeldam
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AssigneeAkzo N.V.
InventorGerrit C. Dubbeldam
Estimating the term…
A process for determining the thickness and/or change in thickness of a thin layer applied to a carrier, the process comprising radiating the carrier coated with the thin layer with a plane polarized light beam at a single incident angle and detecting the reflectance on the carrier and layer. The light reflected by the carrier and the thin layer is split into a p-polarized part and an s-polarized part, after which the respective intensities (I.sub.s).sub.r and (I.sub.p).sub.r l of the reflected s-polarized light and p-polarized light are measured simultaneously for the two parts, and calculating a quantity M according to the equation: ##EQU1## in which formula R.sub.s is the ratio of the intensities (I.sub.s).sub.r and (I.sub.s).sub.i of the reflected and incident s-polarized light, respectively; R.sub.p is the ratio of the intensities (I.sub.p).sub.r and (I.sub.p).sub.i of the reflected and incident p-polarized light, respectively; m is the ratio of the intensities (I.sub.p).sub.i and (I.sub.s).sub.i of the incident p- and s-polarized light, respectively; and the quantity M is a function of the thickness of the thin layer.
A process comprising radiating a carrier having a thin layer coated thereon with a plane polarized light beam at a single incident angle, detecting the reflectance on the carrier and layer, splitting the light reflected by the carrier and the thin layer into a p-polarized part and an s-polarized part, after which the respective intensities (I.sub.s)r and (I.sub.p).sub.r of the reflected s-polarized and p-polarized light are measured simultaneously for the two parts, and calculating a quantity M according to the equation:
An apparatus for use in determining the thickness of a layer, comprising a substrate for carrying said layer, a beam splitter, a laser source for directing a plane polarized beam toward said substrate, said plane polarized beam being reflected by said substrate and said layer toward said beam splitter, said beam splitter splitting the reflected polarized beam into a p-polarized beam and an s-polarized beam, a first detector for detecting an intensity of said p-polarized beam and a second detector for detecting an intensity of said s-polarized beam and a processing unit for calculating a quantity ##EQU4## in which R.sub.s is the ratio of the intensities (I.sub.s).sub.r and (I.sub.s).sub.i of the reflected and incident s-polarized light, respectively;
Dependencies are inferred from the claim text.