Dioxolane, diol and diacrylate silicon compounds and method for their preparation and use
AssigneeDow Corning Corporation
InventorPeter Y. K. Lo
Life of this patent
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Abstract
Dioxolane-substituted silicon compounds are prepared by a hydrosilylation reaction between a silicon hydride and an aliphatically unsaturated dioxolane compound. The dioxolane-substituted silicon compounds are thereafter converted to diol-substituted silicon compounds and then to diacrylate-substituted silicon compounds. The latter are useful in a curable coating composition for providing a substrate with an adhesive-releasing coating.
Claims30
A method comprising mixing components comprising
- (i) an amount of a dioxolane compound having the formula ##STR30## (ii) an amount of a silicon hydride compound containing at least one silicon-bonded hydrogen atom, the relative amounts of (i) and (ii) being sufficient to provide one site of aliphatic unsaturation for every silicon-bonded hydrogen atom to be reacted and
- (iii) an amount of a hydrosilylation catalyst sufficient to accelerate a reaction between the silicon-bonded hydrogen atoms of the silicon hydride with the aliphatic unsaturation of the dioxolane compound;
- and causing, by heating the mixture, or allowing a hydrosilylation reaction to occur between the dioxolane compound and the silicon hydride compound, thereby forming a dioxolane-substituted organosilicon compound containing at least one silicon-bonded dioxolane radical having the formula ##STR31## where Q' is a monovalent, aliphatically unsaturated organic radical, M is a monovalent hydrocarbon radical free of aliphatic unsaturation containing from 1 to 6 carbon atoms, M' is H or M, and Q is a divalent organic radical which is bonded to a silicon atom by way of a silicon-carbon bond;
- all remaining silicon valences of the silicon hydride and of the dioxolane-substituted organosilicon compound being satisfied by radicals free of aliphatic unsaturation selected from the group consisting of monovalent hydrocarbon radicals, monovalent halohydrocarbon radicals, monovalent hydrolyzable radicals, hydrogen atoms, divalent radicals joining silicon atoms and mixtures thereof.
A dioxolane-substituted organosilicon compound containing at least one silicon-bonded dioxolane radical having the formula ##STR40## where Q is a divalent organic radical which is bonded to the silicon atom by way of a silicon-carbon bond, M is a monovalent hydrocarbon radical free of aliphatic unsaturation containing from 1 to 6 carbon atoms and M' is H or M;
- all remaining silicon valences of the dioxolane-substituted organosilicon compound being satisfied by radicals free of aliphatic unsaturation selected from the group consisting of monovalent hydrocarbon radicals, monovalent halohydrocarbon radicals, monovalent hydrolyzable radicals, hydrogen atoms, divalent radicals joining silicon atoms and mixtures thereof.
An diol-substituted organosilicon compound containing at least one silicon-bonded diol radical having the formula ##STR44## where Q is a divalent organic radical which is bonded to the silicon atom by way of a silicon-carbon bond;
- all remaining silicon valences of the diol-substituted organosilicon compound being satisfied by radicals free of aliphatic unsaturation selected from the group consisting of monovalent hydrocarbon radicals, monovalent halohydrocarbon radicals, monovalent hydrolyzable radicals, hydroxyl radicals, hydrogen atoms, divalent radicals joining silicon atoms and mixtures thereof.
A composition comprising a diacrylate-substituted organosilicon compound containing at least one silicon-bonded diacrylate radical having the formula ##STR46## where Q is a divalent organic radical which is bonded to the silicon atom by way of a silicon-carbon bond and R" is H or CH.sub.3 ;
- all remaining silicon valences of the diacrylate-substituted organosilicon compound being satisfied by radicals free of aliphatic unsaturation selected from the group consisting of monovalent hydrocarbon radicals, monovalent halohydrocarbon radicals, monovalent hydrolyzable radicals, hydrogen atoms, divalent radicals joining silicon atoms and mixtures thereof.
A process comprising applying a composition comprising a diacrylate-substituted organosilicon compound to a substrate and thereafter exposing the applied coating to acrylate-polymerizing radiation until said organosilicon compound has been converted to the solid state, said organosilicon compound contains at least one silicon-bonded diacrylate radical having the formula ##STR48## where Q is a divalent organic radical which is bonded to the silicon atom by way of a silicon-carbon bond and R" is H or CH.sub.3 ;
- all remaining silicon valences of the diacrylate-substituted organosilicon compound being satisfied by radicals free of aliphatic unsaturation selected from the group consisting of monovalent hydrocarbon radicals, monovalent halohydrocarbon radicals, monovalent hydrolyzable radicals, hydrogen atoms, divalent radicals joining silicon atoms and mixtures thereof.
Dependencies are inferred from the claim text.