Wand optics column and associated array wand and charged particle source

A monolithic multilayer ion source comprising:

• a gas chamber for containing gas to be ionized and accelerated by said ion source, said gas chamber having means for maintaining the gas at a first pressure P.sub.1;
• an integrated substrate having a first face in communication with the gas in said gas chamber, said integrated substrate being formed of a material that is permeable to the gas;
• an integrated blocking layer on a second face of said substrate opposite the gas chamber, said integrated blocking layer being formed of a material that will block the flow of the gas or ions thereof;
• an integrated extraction electrode on the face of the integrated blocking layer remote from said substrate, said integrated extraction electrode having associated means for supplying an electric potential thereto;
• an aperture formed through said integrated blocking layer and extraction electrode and in communication with said substrate and means for maintaining the pressure in the aperture at a second pressure P.sub.2, where Phd 1 is greater than P.sub.2;
• whereby gas from said chamber passes through said integrated substrate due to the pressure differential between P.sub.1 and P.sub.2, and ions thereof are accelerated from the surface from the substrate by said integrated extraction electrode for establishing a flow of ions through and out of said aperture.

A monolithic multilayer wand optics column and ion source for the exposure of pattern on a target through the use of ion beams, said column comprising:

• a monolithic multilayer ion source having a gas chamber for containing gas to be ionized and accelerated by said ion source, said gas chamber having means for maintaining the gas at first pressure P.sub.1;
• an integrated substrate having a first face in communication with the gas in said gas chamber, said integrated substrate being formed of a material that is permeable to the gas;
• an integrated blocking layer on a second face of said integrated substrate opposite the gas chamber, said integrated blocking layer being formed of a material that will block the flow of the gas or ions thereof;
• an integrated extraction electrode on the face of the integrated blocking layer remote from said integrated substrate, and integrated blocking electrode having associated means for supplying an electrode potential thereto;
• an aperture formed through said integrated blocking layer and extraction electrode and in communication with said integrated substrate and means for maintaining the pressure in the aperture at a second pressure P.sub.2, where P.sub.1 is greater than P.sub.2;
• whereby gas from said chamber passes through said integrated substrate due to the pressure differential between P.sub.1 and P.sub.2, and ions thereof are accelerated from the surface of the integrated substrate by said extraction electrode for establishing a flow of ions through and out of said aperture;
• a monolithic multilayer array wand mounted on said monolithic multilayer ion source, said monolithic multilayer array wand including an integrated conductive deflector layer, at least one integrated lens layer and at least one aperture formed through the integrated blocking, deflector and lens layers in substantially parallel alignment to the path of the incoming ions, said aperture providing a collimated beam of ions passing therethrough, said monolithic multilayer array wand including an integrated lens for focusing said collimated beams of ions;
• said integrated deflector providing a primary conductive path for switching voltages or shaping, controlling and deflecting the individual beams passing through the associated apertures;
• and
• said at least one integrated lens layer focusing said collimated beams of ions.