Polymer with reduced internal migration
AssigneeMinnesota Mining and Manufacturing Company
InventorsAndrew J. Ouderkirk, John T. Simpson, Robert W. Warner, Douglas S. Dunn
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Abstract
Semicrystalline polymers and copolymers having migratory additives therein can be provided with reduced migration. A surface layer of the polymer of copolymer article is rendered quasi-amorphous and a film less penetrable by said migratory additives than the polymer or copolymer is adhered thereto.
Claims7
A process for reducing the migration of migratory materials from film comprising a semicrystalline polymer, said process comprising modifying the surface of a semicrystalline polymer by irradiating at least one surface of a semicrystalline polymer composition containing at least one migratory ingredient with radiation which is absorbed by said composition, controlling the intensity and fluence of said radiation exposure so that semicrystalline polymer on said surface is melted and there is ablation or volatilization of less than 0.1% by weight of the total weight of the polymer in melted areas, and allowing said melted polymer to cool at a rate which will form a quasi-amorphous polymeric area on said at least one surface, and then coating said at least one surface with a polymer that is less penetrable by said migratory ingredient in said composition than is said composition.
Dependencies are inferred from the claim text.