Surface inspection method and apparatus therefor
AssigneeKabushiki Kaisha Toshiba
InventorsYuichiro Yamazaki, Motosuke Miyoshi, Shigeru Ogawa, Katsuya Okumura
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AssigneeKabushiki Kaisha Toshiba
InventorsYuichiro Yamazaki, Motosuke Miyoshi, Shigeru Ogawa, Katsuya Okumura
Estimating the term…
A novel technique suitable for inspection or examination of the surface condition of a substrate such as a semiconductor wafer. First is one irradiates a light e.g. a laser beam on a substrate surface to focus a scattered light therefrom. Next detects the scattered light focused e.g. with a photomultiplier tube, thus to inspect the substrate surface. When the detection of the scattered light is thus carried out, correction means e.g. a circuit for controlling a voltage applied to the photomultiplier tube, a filter having a variable light-screening factor, a movable iris or an amplification factor adjustment circuit etc. is used to correct the detection sensitivity in accordance with the reflectivity of the substrate surface. Practically, such a corrective operation is carried out on the basis of the intensity of a scattered light or a regularly reflected light from the substrate surface. Further, it may be possible to obtain a signal for control of the corrective operation by averaging signals detected when the substrate surface is subject to scanning of an irradiating light. Thus, this surface inspection technique can detect particles attached on the substrate surface always utilizing the same slice level and the same sensitivity even when substrates having different indices of reflection are employed.
A method of inspecting a substrate surface having a known reflectivity to detect the diameters of particles on the substrate surface, comprising the steps of:
A method of inspecting a substrate surface having a known reflectivity to detect the diameters of particles on the substrate surface, comprising the steps of:
An apparatus for inspecting a substrate surface, having a known reflectivity to detect the diameters of particles on the substrate surface, comprising:
An apparatus for inspecting a substrate surface having a known reflectivity to detect the diameters of particles on the substrate surface, comprising:
Dependencies are inferred from the claim text.