Photo-chemical vapor deposition apparatus

A photo-CVD apparatus comprising,

• a main chamber which is hermetically sealed and is provided with a transmitting window for transmitting light radiated from a light source,
• a holder for holding an article on which a thin film is grown, said holder moving in a predetermined direction so that a predetermined point of said article is positioned to coincide with an imaging point of said light,
• a process chamber for containing said article and growing said thin film on said article, said process chamber being defined to have a predetermined area on said holder and under said transmitting window,
• a seal wall for providing a fluid resistance between said main chamber and said process chamber, said seal wall defining said predetermined area of said process chamber,
• an inert gas supply means for supplying inert gas to said main chamber, a gas pressure of said main chamber being greater than that of said process chamber,
• a process gas supply means for supplying process gas to said process chamber,
• a process chamber exhaust means for exhausting gas charged in said process chamber, and
• an inert gas exhaust means for exhausting said inert gas which is supplied from said inert gas supply means to maintain a predetermined pressure difference between said main chamber and said process chamber.