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US 4,901,125 AGranted
Charge coupled device capable of efficiently transferring charge
AssigneeKabushiki Kaisha Toshiba
InventorTetsuo Yamada
Life of this patent
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Abstract
A charge coupled device includes a main transfer channel having an n-type region formed in the surface area of a p-type silicon substrate and a plurality of electrodes formed over and insulated from the transfer channel and arranged in the direction in which the transfer channel extends. The charge coupled device further includes an n.sup.+-type sub-transfer channel formed in the n-type region with an impurity concentration higher than that of the n-type region.
Claims8
A charge coupled device comprising:
- a semiconductor substrate of a first conductivity type;
- a channel region of a second conductivity type formed in a surface area of said semiconductor substrate, extending in one direction and serving as a transfer channel;
- charge supplying means, substantially adjacent to said channel region in the lateral direction of said channel region, for supplying charge to said channel region;
- electrode means insulated from said channel region, for applying a control voltage to said channel region to transfer charge through said channel region;
- and
- potential control means for efficiently transferring small amounts of charge through at least one subregion of said channel region while transferring large amounts of charge through the entire channel region, including a plurality of electrical barrier regions formed in said channel region extending in said one direction substantially throughout said transfer channel and containing an impurity of the first conductivity type, the impurity concentration of each of said electrical barrier regions being inversely proportional to the distance between it and said charge supplying means and the electrostatic potential energy of each of said electrical barrier regions being set at a level higher than that of said transfer channel and lower than that of said substrate outside of said transfer channel when said control voltage is applied thereto.
3 more elements
A charge coupled device comprising:
- a semiconductor substrate of a first conductivity type;
- a channel region of a second conductivity type formed in a surface area of said semiconductor substrate, extending in one direction and serving as a transfer channel;
- charge supplying means substantially adjacent to said channel region in the lateral direction of said channel region, for supplying charge to said channel region;
- electrode means insulated from said channel region, for applying a control voltage to said channel region to transfer charge through said channel region;
- potential control means for efficiently transferring small amounts of charge through at least one subregion of said channel region while transferring large amounts of charge through the entire channel region, including a plurality of electrical barrier regions formed in said channel region extending in said one direction substantially throughout said transfer channel and containing an impurity of the first conductivity type, the electrostatic potential energy of each of said electrical barrier regions being set at a level higher than that of said transfer channel and lower than that of said substrate outside of said transfer channel when said control voltage is applied thereto;
- and
- an output circuit to which the charge transferred through said channel region is supplied;
- wherein said electrical barrier regions have different lengths to cause the transferred charge to be gradually combined at an end portion of said channel region.
5 more elements
Dependencies are inferred from the claim text.