Radiation-resistant high molecular composition
AssigneesToyo Soda Manufacturing Co., Ltd., Furukawa Electric Co., Ltd.
InventorsMasashige Kubo, Yukihiro Tsutsumi, Fumio Okisaki, Shunichi Fujimura, Teruo Fukuka
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Abstract
A radiation-resistant high molecular composition is disclosed, characterized in that, to the high molecular polymer, a halogenated acenaphtylene and/or condensates thereof represented by a following general formula [I] ##STR1## (wherein, X indicates a chlorine or bromine atom, a indicates 0 to 2, b indicates 1 to 6 and n indicates an integer not less than 1) and a diphenyl ether derivative represented by a following general formula [II] ##STR2## (wherein, R.sub.1 and R.sub.2 indicate any ones of hydrogen atom, alkyl, alkoxy, phenyl phenoxy, diphenyloxy and terphenyloxy group) and/or basic lead compound are formulated.
Claims9
A radiation-resistant high molecular composition comprising a high molecular polymer, a halogenated acenaphthylene and/or condensates thereof represented by the following general formula (I):
- ##STR10## wherein, X indicates a chlorine or bromine atom, a indicates 0 to 2, b indicates 1 to 6 and n indicates an integer not less than 1, and a diphenyl ether derivative represented by the following general formula (II):
- ##STR11## wherein R.sub.1 and R.sub.2 independently indicate hydrogen, alkyl, alkoxy, phenyl phenoxy, diphenyloxy or terphenyloxy.
Dependencies are inferred from the claim text.