Method of fabrication for optical storage apparatus
AssigneeKanegafuchi Chemical Industry Co., Ltd.
InventorTakada Jun
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Abstract
An optical memory comprising a doping modulated multilayer made of amorphous semiconductor, and at least two electrodes, one of the electrodes being transparent and the multilayer being sandwiched between two electrodes. Data is written by increasing the electrical conductance of the amorphous semiconductor by irradiating it is light. Data is erased by the application of a bias voltage to the electrodes and also by irradiating the amorphous semiconductor with light having photon energy of approximately half or less of the optical energy band gap of the amorphous semiconductor. The memory effect can be maintained for a week or longer, and the memory can be erased without heating the memory device, whereby the lifetime of the device is lengthened.
Claims17
A method of fabrication of an optical memory comprising the steps of:
- forming at least one electrode on a substrate;
- forming a reversible, doping modulated multilayer of amorphous semiconductor such that a first side is in electrical contact with the electrode;
- and
- forming at least one electrode on the semiconductor such that the electrode is in electrical contact with a second side of the semiconductor opposite the first side.
Dependencies are inferred from the claim text.