Converting a carbon preform object to a silicon carbide object
AssigneeNone recorded
InventorHarry Levin
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AssigneeNone recorded
InventorHarry Levin
Estimating the term…
A process for converting in depth a carbon or graphite preform object to a silicon carbide object, silicon carbide/silicon object, silicon carbide/carbon-core object, or a silicon carbide/silicon/carbon-core object, by contacting it with silicon liquid and vapor over various lengths of contact time in a reaction chamber. In the process, a stream comprised of a silicon-containing precursor material in gaseous phase below the decomposition temperature of said gas and a coreactant, carrier or diluent gas such as hydrogen is passed through a hole within a high emissivity, thin, insulating septum into the reaction chamber above the melting point of silicon. The thin septum has one face below the decomposition temperature of the gas and an opposite face exposed to the reaction chamber. Thus, the precursor gas is decomposed directly to silicon in the reaction chamber. Any stream of decomposition gas and any unreacted precursor gas from the reaction chamber is removed. A carbon or graphite preform object placed in the reaction chamber is contacted with the silicon. The carbon or graphite preform object is recovered from the reactor chamber after it has been converted to a desired silicon carbide, silicon and carbon composition.
A process for converting a carbon or graphite object partially or entirely to a silicon carbide object, by contacting said carbon or graphite object with silicon liquid and vapor in a reaction chamber for a selected period of time said process comprising the steps of:
Dependencies are inferred from the claim text.
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Chemical, physical or physico-chemical processes in general; Their relevant apparatus: apparatus characterised by being constructed of material…
By decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material: by decomposition of…
By decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material: by decomposition of…
Apparatus characterised by their chemically-resistant properties: comprising coatings on the surfaces in direct contact with the reactive components
Term ended 13 Feb 2007 (estimated)
USPTO file history isn’t available for this patent, so only indexed dates are shown.
1. Field of the Invention
The present invention is directed to a process and apparatus for making solar and semiconductor grade silicon by thermal reaction of a suitable precursor gas composition. More particularly, the present invention is directed to a process and apparatus for continuous production of solar and semiconductor grade silicon in the liquid phase, by thermal decomposition of a suitable precursor gas, such as silane.
2. Description of the Prior Art
FIG. 1 is a schematic cross-sectional view showing the reactor apparatus of the present invention enclosed in an outer cylinder;
FIG. 2 is a schematic cross-sectional view showing the reactor apparatus of the present invention;
FIG. 3 is a schematic perspective view showing a precursor gas inlet tube assembly to be incorporated in the reactor apparatus of present invention, and
A preferred embodiment of the invention is a process for directly producing molten silicon, said process comprising the steps of:
(a) passing a stream comprising silane gas below the decomposition temperature of silane through a high emissivity, thin, insulating septum into a noncontaminating reaction chamber above the melting point of silicon, said thin septum having one face below the decomposition temperature of silane and an opposite face exposed to said reaction chamber, whereby said silane gas is decomposed directly to molten silicon in said reaction chamber;
(b) removing a stream of decomposition hydrogen gas and any unreacted silane from said reaction chamber; and