Pattern-matching sewing machine
AssigneeKogyo Kabushiki Kaisha
InventorsEtsuzo Nomura, Hirokazu Takeuchi, Shigeru Suzuki, Kazunori Irie, Hirosumi Itoh
Life of this patent
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Abstract
A pattern-matching sewing machine that constantly samples photo-intensity data during calculation of a mismatch distance and during adjustment of the feeding mechanism based on the calculated mismatch distance. When the adjustment is finished, a new mismatch-distance calculation is quickly started, not by waiting for sampling new photo-intensity data of a predetermined number, but by using photo-intensity data of the predetermined number including the data thus sampled during the previous calculation and adjustment, and the previously stored data which have been used in the previous calculation.
Claims4
A sewing machine for sewing two sheets having the same pattern comprising:
- first and second feeding means each for intermittently feeding one of the sheets;
- first and second photo-sensing means each for optically sensing the pattern on one of the sheets during feeding and for generating photo-intensity data of a plurality of points on the sheet;
- a memory for sequentially storing a plurality of the photo-intensity data;
- a data retrieval means for retrieving a predetermined number of the newest photo-intensity data from the memory every preset cycle time, the predetermined number corresponding to a preset feeding distance of the sheets, and the preset cycle time being shorter than a feeding time for the preset feeding distance;
- a mismatch detecting means for calculating a mismatch distance of the patterns on the two sheets using the predetermined number of retrieved data, the calculation being finished within the preset cycle time;
- and
- a feed-adjusting means, based on the calculated mismatch distance, for adjusting one of the feeding means to match the patterns.
Dependencies are inferred from the claim text.