Polyester compositions containing the residue of a naphthopyran compound and shaped articles produced therefrom
AssigneeEastman Kodak Company
InventorsMax A. Weaver, Wayne P. Pruett, Samuel D. Hilbert, Clarence A. Coates, Jr.
Life of this patent
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Abstract
Disclosed are compositions useful for molding into articles such as food containers, beverage bottles, cured structural plastics and the like comprising a polyester such as a linear, thermo-plastic polyester having reacted or copolymerized therein the residue of a 3H-naphtho[2,1-b]pyran-3-one or 3H-naphtho[2,1-b]pyran-3-imine compound. The naphthopyran compounds and residues are stable at the high temperatures at which the polymers are prepared and absorb radiation in the range of 350 to 450 nm.
Claims8
A composition comprising molding or fiber-grade polyester having reacted or copolymerized therein the residue of a naphthopyran compound having the formula ##STR41## wherein R.sup.1 and R.sup.2 are independently selected from hydrogen, --R.sup.5, hydroxy, --O--R.sup.5, halogen, ##STR42## amino or ##STR43## R.sup.4 is cyano, ##STR44## carbamoyl, ##STR45## --SO.sub.2 --R.sup.6, or an unsubstituted or substituted carbocyclic or heterocyclic or homocyclic aryl radical;
- and
- X is oxo or imino;
- wherein
- R.sup.5 is alkenyl or an unsubstituted or substituted alkyl, cycloalkyl or aryl radical;
- R.sup.6 is hydrogen or an alkyl, cycloalkyl or aryl radical;
- and ##STR46## collectively are a group having the structure ##STR47## wherein D is --CH.sub.2 --, --O--, --S--, --SO.sub.2 --, --N(R.sup.5)--, ##STR48## or --N(SO.sub.2 --R.sup.6)--;
- provided the naphthopyran compound bears at least one substituent that is reactive with one of the monomers from which the polyester polymer is derived, said naphthopyran residue absorbing radiation in the range of about 350 to 450 nm and being non-extractable from said polymer and stable under the polymer processing conditions.
A composition comprising molding or fiber grade linear polyester having copolymerized therein or reacted therewith about 200 to 800 ppm of the residue of a naphthopyran compound having the formula ##STR49## wherein R.sup.1 is hydrogen, hydroxy, hydroxyalkoxy, alkanoyloxyalkoxy, alkoxycarbonylalkoxy, alkoxycarbonylphenylalkoxy, N,N-bis-(hydroxyalkyl)amino, N-alkyl-N-alkanoyloxyalkylamino, N-aryl-N-hydroxyalkylamino, N-alkyl-N-hydroxyalkylamino, N-aryl-N-alkanoyloxyalkylamino, or N,N-bis(alkanoyloxyalkyl)-amino;
- and N,N-bis(alkanoyloxyalkyl)amino, N-alkyl-N-carboxyalkylamino, N,N-bis(carboxylalkyl)amino, N-alkyl-N-alkoxycarbonylalkylamino, N,N-bis(alkoxycarbonylalkyl)amino, N-alkyl-N-alkoxycarbonylbenzylamino, N,N-bis(alkoxycarbonylbenzyl)amino, N-alkyl-N-carboxybenzylamino or N,N-bis(carboxybenzyl)amino;
- and
- R.sup.4 is alkoxycarbonyl, arylsulfonyl, cyano, 2-benzoxazolyl, carboxy-2-benzoxazolyl, alkoxycarbonyl-2-benzoxazolyl, 2-benzothiazolyl, carboxy-2-benzothiazolyl, alkoxycarbonyl-2-benzothiazolyl, 2-benzimidazolyl, carboxy-2-benzimidazolyl or alkoxycarbonyl-2-benzimidazolyl;
- wherein each alkyl group and alkyl moiety contains up to 6 carbon atoms and each aryl group is phenyl or phenyl substituted with alkyl of up to 4 carbon atoms or halogen;
- provided the naphthopyran compound bears at least one substituent that is reactive with one of the monomers from which the polyester polymer is derived, said naphthopyran residue absorbing radiation in the range of about 350 to 450 nm and being non-extractable from said polymer and stable under the polymer processing conditions.
Dependencies are inferred from the claim text.