Processing apparatus and method
AssigneeTexas Instruments Incorporated
InventorsCecil J. Davis, Robert T. Matthews, Lee M. Loewenstein, Rhett B. Jucha, Randall C. Hildenbrand, John I. Jones
Life of this patent
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Abstract
A process module having remote plasma and in situ plasma generators, a source of ultraviolet, and a radiant heater, which represent four separate energy sources. The four sources can be used singly or in any combination and can be separately controllable.
Claims40
A vacuum process module capable of receiving a workpiece comprising:
- (a) a process chamber;
- (b) a remote plasma generator remote from said process chamber;
- (c) an in situ plasma generator within said process chamber;
- (d) a radiant heater coupled to said process chamber;
- and
- (e) a source of ultraviolet light within said process module.
A vacuum process module capable of receiving a workpiece comprising:
- (a) a plasma generator generating at least free radicals remote from and in fluid communication with said workpiece;
- (b) an in situ plasma generator generating a plasma, said plasma being coupled to said workpiece;
- (c) a heater coupled to said workpiece;
- and
- (d) a source of ultraviolet light coupled to said workpiece.
A control system for use with a semiconductor processing module, comprising:
- (a) a plurality of independent energy sources coupled into the same process chamber;
- (b) at least one power source for each energy source having a first input;
- and
- (c) a computer system which is electrically coupled to said first input.
A control system for use with a semiconductor processing module comprising:
- (a) a plurality of independent energy sources coupled into the same process chamber;
- (b) at least one power source for each energy source having a first input;
- (c) a control system providing sequential control which is electrically coupled to said first input.
A control system for use with a semiconductor processing module comprising:
- (a) a plurality of independent energy sources coupled into the same process chamber;
- (b) at least one power source for each energy source having a first input;
- (c) a plurality of controllers which are electrically coupled to said first input and having a second input;
- and
- (d) a computer system which is electrically coupled to said second input.
A control system for use with a semiconductor processing module comprising:
- (a) a plurality of independent energy sources coupled into the same process chamber each energy source having a first input;
- and
- (b) a computer system which is electrically coupled to at least some of said first inputs.
A control system for use with a semiconductor processing module comprising:
- (a) a plurality of independent energy sources coupled into the same process chamber comprising;
- (b) each energy source having a first input;
- (c) a control system providing sequential control which is electrically coupled to said first input.
A control system for use with a semiconductor processing module comprising:
- (a) a plurality of independent energy sources coupled into the same process chamber;
- (b) each energy source having a first input;
- (c) a plurality of controllers which are electrically coupled to said first input and having a second input;
- and
- (d) a computer system which is electrically connected to said second input.
A control system for use with a semiconductor processing module which has a plurality of independent energy sources coupled into the same process chamber comprising;
- (a) a separate power source for each energy source having a first input;
- and
- (b) a computer system which is electrically connected to said first input.
A control system for use with a semiconductor processing module which has a plurality of independent energy sources coupled into the same process chamber comprising;
- (a) a separate power source for each energy source having a first input;
- (b) a control system providing sequential control which is electrically connected to said first input.
A control system for use with a semiconductor processing module which has a plurality of independent energy sources coupled into the same process chamber comprising;
- (a) a separate power source for each energy source having a first input;
- (b) a plurality of controllers which are electrically connected to said first input and having a second input;
- and
- (c) a computer system which is electrically connected to said second input.
A control system for use with a semiconductor processing module which has at least two independent energy sources coupled into the same process chamber comprising;
- (a) a separate power source for each energy source having a first input;
- and
- (b) a computer sytem which is electrically connected to said first input.
A control system for use with a semiconductor processing module which has at least two independent energy sources coupled into the same process chamber comprising;
- (a) a separate power source for each energy source having a first input;
- (b) a control system providing sequential control which is electrically connected to said first input.
A control system for use with a semiconductor processing module which has at least two independent energy sources coupled into the same process chamber comprising;
- (a) a separate power source for each energy source having a first input;
- (b) a plurality of controllers which are electrically connected to said first input and having a second input;
- and
- (c) a computer system which is electrically connected to said second input.
A method processing a workpiece in a process chamber comprising the steps of:
- (a) introducing free radicals to the workpiece;
- (b) coupling an energy source to the process chamber;
- (c) independently controlling free radical and other particle concentrations and energies in said process chamber.
A method for controlling at least a first and second independent energy source coupled into the same semiconductor processing chamber comprising;
- (a) providing at least one power source for each of said first and second independent energy sources;
- and
- (b) controlling said at least one power source using a computer system.
A method for controlling a plurality of independent energy sources coupled into the same semiconductor processing chamber comprising;
- (a) applying a first selected energy level to a first energy source;
- (b) applying a second selected energy level to a second energy source;
- and
- (c) modifying said first selected energy level.
Dependencies are inferred from the claim text.