Method of manufacturing electrically conductive molded bodies by plasma-activated chemical deposition from the gaseous phase
AssigneeU.S. Philips Corporation
InventorsGeorg F. Gartner, Hans-Jurgen Lydtin
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Abstract
Layers of electrically conductive material are deposited in a standing microwave field. The deposition is done on an electrically conductive substrate in which a part of the surface forms a part of the inner wall of a microwave cavity resonator. As a result of this the microwave energy is used optimally. Measures are taken to keep the coupling place of the microwave ("window") free from an electrically conductive growth. The substrate is preferably moved periodically or aperiodically relative to the plasma and the remaining walls of the resonator.
Claims13
A method of manufacturing a shaped body of at least an electrically conductive material by a plasma-activated chemical deposition of the material, from a gaseous phase comprising at least a starting compound of the material, onto a substrate consisting of a second electrically conductive material which substrate is then removed from the deposited material after completion of deposition of the material wherein:
- (a) the gaseous phase of an electrically conductive material is introduced into a reaction space formed as a microwave cavity resonator whose inner wall comprising at least a part of the substrate on which the electrically conductive material is deposited;
- (b) the microwaves are applied at a site in the reaction space which is kept free from growing layers of electrically conductive material;
- (c) the microwaves produce a standing microwave field in the reaction space;
- and
- (d) electrically conductive material is deposited on the inner wall of said resonator.
A method of manufacturing a shaped body of at least an electrically conductive material by a plasma-activated chemical deposition of the material, from a gaseous phase comprising at least a starting compound of the material, onto a substrate consisting of a second electrically conductive material which substrate is then removed from the deposited material after completion of deposition of the material wherein:
- (a) the gaseous phase of an electrically conductive material is introduced into a reaction space formed as a microwave cavity resonator whose inner wall comprises at least a part of the substrate on which the electrically conductive material is deposited;
- (b) the microwaves are applied at a site in the reaction space which is kept free from growing layers of electrically conductive material;
- (c) the microwaves produce a standing microwave field in the reaction space;
- and
- (d) electrically conductive material is deposited on the inner wall of said resonator
- wherein deposition rates are obtained that are substantially higher than those obtained when said microwave cavity resonator does not comprise at least a part of the substrate on which the electrically conductive material is deposited.
Dependencies are inferred from the claim text.