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AssigneeMassachusetts Institute of Technology
InventorsDaniel J. Ehrlich, Mordecai Rothschild
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The invention relates to visible-laser deposition reactions of metal containing oxyhalide and carbonyl vapors, such as, chromyl chloride vapor, CrO.sub.2 Cl.sub.2, or cobalt carbonyl, Co.sub.2 (CO).sub.8, for direct writing of metal containing opaque patterns on various substrates (Si, SiO.sub.2, GaAs and glass). Deposition at low laser power is by photolysis of adsorbed reactant molecules. Higher powers initiate deposition photochemically and continue it with a combined photolytic/pyrolytic reaction, simultaneously inducing a solid-phase conversion of the deposited film. Mixed Cr.sub.2 O.sub.3 /CrO.sub.2 or cobalt thin films of 1-nanometer to several-micrometer thickness, as well as 1-millimeter-long single crystals of Cr.sub.2 O.sub.3 or cobalt, can be grown with this process, the former at rates up to 3 .mu.m/s. Thin chromium oxide films produced in this manner are strongly ferromagnetic.
A method for a substantially photolytic photodepostion of cobalt film on a surface of a photomask substrate disposed in a reaction chamber comprising the steps of:
A method for deposition of metal containing films on a surface of a substrate disposed in a reaction chamber comprising the steps of:
A method for deposition of metal containing films on a surface of a substrate disposed in a reaction chamber comprising the steps of:
A method for deposition of metal films on a surface of a substrate disposed in a reaction chamber comprising the steps of:
Dependencies are inferred from the claim text.