High speed chemical vapor deposition process utilizing a reactor having a fiber coating liquid seal and a gas sea;
AssigneeHewlett-Packard Company
InventorsChristopher A. Schantz, Ronald Hiskes
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Abstract
A CVD furnace, having a gas seal and a liquid seal, for chemical vapor deposition of a coating on a fiber. A CVD process utilizing the CVD furnace allows fibers to be pulled through the furnace without drawing gases entrained by the moving fiber into the reaction chamber of the furnace. The process is a hot fiber process, preferably deriving its heat from the meltdown point in an optical fiber pulling process. A coat containing carbon is applied by supplying a reactant containing a carbon having a triple bond. A small amount of silane is also supplied to the reaction chamber to act as an oxygen getter and to prevent tar-like reaction products from clogging the furnace.
Claims10
A chemical vapor deposition (CVD) process for coating a fiber, said process comprising the steps of:
- pulling said fiber through a first seal and second seal of a CVD furnace comprising a reaction chamber wall enclosing a reaction chamber in which chemical vapor deposition is to take place, said reaction chamber wall having a plurality of openings including a reactant inlet for entry of reactants to provide reactant gases within said reaction chamber, and exhaust port for removal of gases from said reaction chamber, and a pair of fiber apertures through which said fiber can be pulled said first seal being located at a first of these two apertures to allow entry to the fiber into the reaction chamber and said second seal being located at a second of these two apertures to allow exit of the fiber from the reaction chamber, wherein a first of these seals is a gas seal and a second of these is a liquid seal;
- injecting at least one reactant gas through said reactant inlet.
Dependencies are inferred from the claim text.