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US 4,849,379 AGranted
Dielectric composition
AssigneeE. I. Du Pont de Nemours and Company
InventorCornelius J. McCormick
Life of this patent
Estimating the term…
Abstract
A composition for making low K dielectric layers which is an admixture of finely divided solids consisting essentially of (a) lead-free amorphous borosilicate glass containing Al.sub.2 O.sub.3, a mixture of oxides of alkali metals, alkaline earth metals or mixtures thereof containing Li.sub.2 O and (b) an inorganic filler selected from quartz and mixtures of quartz with 0.5-5% wt. inert oxides having a TCE equal to or greater than 7.
Claims6
A composition for making low K dielectric layers which is an admixture of finely divided solids consisting essentially of:
- (a) 55-75% wt. lead-free amorphous borosilicate glass in which the weight ratio of B.sub.2 O.sub.3 to SiO.sub.2 is 0.22-0.55 containing 0.5-1.5% wt. Al.sub.2 O.sub.3, 1.5-4.0% wt. of a mixture of oxides of alkali metals, alkaline earth metals or mixtures thereof, which oxide mixture contains 0.3-1.0% wt. Li.sub.2 O, basis total glass;
- and
- (b) 45-25% wt. of a ceramic filler selected from alpha-quartz and mixtures thereof with 0.5-5.0% wt. inert oxides having a TCE equal to or greater than 7.
Dependencies are inferred from the claim text.