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AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsKiyoshi Kuribayashi, Makoto Umetani, Hideto Monji, Masaki Aoki
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A base material excellent in heat resistance and high-temperature strength is processed into a desired configuration. The processed base material is coated with a heat-resistant film having excellent strength at high temperatures and low reactivity with a glass material to be molded. A resist is applied on the heat resistant film and a desired pattern is drawn thereon by means of electron beam, ion beam, hologram exposure, or ordinary photolithography. Or if a mold having deep unevenness of the pressing surface is required, the resist is applied after an intermediate layer which permits selective etching is formed on the heat resistant film, and the required pattern is drawn thereon by means of electron beam, ion beam, hologram exposure, or ordinary photolithography. The intermediate layer is removed by wet etching or dry etching to emphasize unevenness of the mask. The resist film or the resist film and intermediate layer film are completely removed and a part of the heat-resistant film is removed to obtain a mold having the desired configuration of the molding surface.
A method of manufacturing a diffraction grating characterized by using a pair of molds, a molding surface of at least one of the molds having a relief corresponding to the diffraction grating, heating a glass material to be molded to a temperature higher than its softening point in an inert gas atmosphere, and pressure molding the glass material to transfer the shapes of the molding surfaces of the molds onto the glass material to be molded, thereby to obtain the diffraction grating.
A method of manufacturing a mold for molding optical glass elements comprising the steps of:
Dependencies are inferred from the claim text.