Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group

Abstract

An electrodepositable photosensitive resin which is a phenolic novolak resin having (i) at least part of the phenolic hydroxyl groups thereof replaced by a quinone diazide sulphonyloxy group, and (ii) at least part of the aromatic rings thereof substituted in a position ortho and/or para to a phenolic hydroxyl group or quinone diazide sulphonyloxy group by a group of formula --CH(R.sup.1)R.sup.2 where R.sup.1 represents a hydrogen atom, or an alkyl, aryl or carboxylic acid group, and R.sup.2 represents a sulphonic acid group --SO.sub.3 H or a group of formula --A--R.sup.3 --X, R.sup.3 represents an aliphatic, aromatic or araliphatic divalent group which may be substituted by a carboxlic, sulphonic or phosphonic acid group, A represents a sulphur atom or a group of formula --N(R.sup.4)--, where R.sup.4 represents a hydrogen atom or an alkyl group which may be substituted by a carboxylic acid group or by an optionally etherified hydroxyl group, or R.sup.3 and R.sup.4 together represent an alkylene chain of 2 to 5 carbon atoms linked to the indicated nitrogen atom, which may contain an oxygen atom or an additional nitrogen atom in the chain, and X denotes a carboxylic or sulphonic acid group or, where A denotes --N(R.sup.4)--, X may further represent a phosphonic acid group, an amino group of formula --N(R.sup.5)(R.sup.6), a hydrogen atom or a hydroxyl group, and Rhu 5 and R.sup.6 which may be the same or different, each represent a hydrogen atom or an alkyl, aryl, aralkyl or alkenyl group, any of which may be substituted by a hydroxyl group. The resins are useful in the manufacture of printed circuits.

Dependencies are inferred from the claim text.