US 4,832,753 A · High-purity cleaning system, method, and apparatus

Abstract

A system for high purity cleaning of components includes a cleaning chamber which is maintained at a pressure above ambient atmospheric pressure. A gas-glide transporter extends through the cleaning chamber and includes a pair of slightly tilted elongate tubes having a plurality of tiny holes therein. The tubes communicate with a source of filtered pressurized nitrogen. A tray for carrying components to be cleaned is adapted to fit on the tubes and slide down the transporter on a frictionless cushion of nitrogen. Components are cleaned of very small particles by using a high pressure spray of individual droplets of solvent which knock the particles off the component to be cleaned. The particles, solvent and solvent vapor are swept away from the component being cleaned by a stream of dry, filtered air. The cleaning chamber group includes a control panel which controls solvent supply and recovery modules. The cleaning chamber group is modular so that it may be placed in a Class 100 environment.

Claims5

Dependent claims

A method of high purity cleaning including particle removal from an item to b cleaned, comprising:

(a) providing a cleaning chamber which may be substantially sealed to provide a clean environment;
(b) introducing an item to be cleaned into said chamber;
(c) introducing a flow of dry, filtered air into said chamber;
(d) maintaining the pressure in said chamber to a pressure which is above atmospheric pressure so as to prevent infiltration of contaminants into said chamber;
(e) providing a high pressure solvent sprayer for introducing and dispersing a spray consisting primarily of individual droplets of solvent into said chamber;
(f) striking said item to be cleaned with said droplets of solvent dispersed from said sprayer so as to dislodge contaminant particles from said item;
(g) directing a substantially laminar flow of dry, filtered air at a temperauure not substantially less than ambient temperature over said item being struck by said droplets of solvent so as to draw solvent and dislodged contaminant particles away from said item being cleaned;
and
(h) performing steps (f) and (g) substantially simultaneously.

6 more elements

Dependencies are inferred from the claim text.

High-purity cleaning system, method, and apparatus

Life of this patent

High-purity cleaning system, method, and apparatus

Life of this patent

Abstract

Claims5