Charged particle optical systems having therein means for correcting aberrations
OwnerGeorge C. King, Frank H. Readinventors
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Abstract
A charged particle optical system, e.g. an energy or mass analyzer or a lens system, has a plurality of corrector electrodes (20 to 23) spaced apart across a particle beam passing from a monoenergetic source (4) to a focus (6) and dividing the beam into individual portions with central trajectories (30,31,32) the connector electrodes being electrically biassed to deflect the particles of the beam so as to reduce the aberration caused by portions with central trajectories intersecting the optical axis at different distances from the desired focus.
Claims16
A charged particle optical system, such for example as an energy analyzer, a mass analyzer or a lens system, the system having
- means, on the optical axis of the system, defining a source of charged particles,
- means, on said optical axis, defining a desired image position, and
- means for defining the path of a beam of substantially monoenergetic particles from said source to said desired image position,
- the system being subject to the aberration in which the trajectories of the particles emitted from the source at relatively large angles to the axis are brought to a focus on the same axis nearer to or further from the source than the trajectories of particles emitted at relatively small angles to the axis,
- the system having a plurality of electrically-insulated corrector electrodes disposed in spaced-apart relationship across the said path of the beam thereby dividing the beam into separate portions and which electrodes, when suitably biassed, so deflect the beam portions as to cause the beam portions to intersect the optical axis at, or closer to, the desired image position, thereby reducing the aberration.
A method of sharpening the focus of a beam of monoenergetic charged particles emitted from a source in an energy analyzer, a mass analyzer or a lens system and brought to a focus on the optical axis of the system, the system being subject to the aberration in which the trajectories of the particles emitted from the source at relatively large angles to the axis are brought to a focus on the same axis either nearer to or further from the source than the trajectories of particles emitted at relatively small angles to the axis, the method comprising passing the beam through a plurality of electrodes spaced apart from one another transversely of the beam to split the beam into a plurality of transversely - spaced beam portions and applying different potentials, to respective electrodes to cause corresponding beam portions to be deflected in a sense to cause the beam portions to intersect the optical axis closer to the desired focus, thereby rendering the aberration.
Dependencies are inferred from the claim text.