Electrodeposition of chromium from a trivalent electrolyte
AssigneeThe United States of America as represented by the Secretary of Commerce
InventorsDavid S. Lashmore, Ilan Weisshaus, Eok NamGoong
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AssigneeThe United States of America as represented by the Secretary of Commerce
InventorsDavid S. Lashmore, Ilan Weisshaus, Eok NamGoong
Estimating the term…
An electrodeposition process and a bath therefore are disclosed for performing the electrodeposition of hard smooth coatings of trivalent chromium. The electrodeposition process is accomplished energy efficiently. The bath includes chromium chloride as a source of chromium, citric acid to complex the chromium, and a wetting agent which is preferably Triton x-100. Preferably, bromide is also provided in the solution to maintain the hexavalent chromium production at the anode at a low level. Ammonium chloride is also preferably provided to improve the conductivity and also the current distribution in the bath. Boric acid is provided to advance the reaction kinetics. The pH of the bath is maintained at approximately 4.0 and the temperature is maintained at approximately 35.degree. C. Either a direct current or pulsed current is used for the deposition process. Hard smooth coatings of trivalent chromium are deposited through use of the process and the bath of the claimed invention.
An aqueous chromium electroplating bath, comprising a plating material source consisting essentially of CrCl.sub.3.6H.sub.2 O;
A method for the electrodeposition of chromium, comprising:
A method according to claim 33, wherein said buffer maintains the pH of the bath at 4.0.+-.0.5.
Dependencies are inferred from the claim text.