Method for parallel fabrication of nanometer scale multi-device structures
AssigneesTrustees of Boston University, University of Colorado Foundation, Inc.
InventorsNoel A. Clark, Kenneth Douglas, Kenneth J. Rothschild
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Abstract
Articles exhibiting fabricated structures with nanometer size scale features (nanostructures), typically a device comprising nanostructures of a functional material on or in a substrate of dissimilar material, are produced by a method employing a substrate base or coating and a thin layer serving as a lithographic mask or template, consisting of a self-assembled ordered material array, typically a periodic array of molecules such as undenatured proteins, exhibiting holes, thickness or density variations. It is possible to produce complex structures containing large numbers of nanometers scale elements through a small number of simple steps.
Claims17
A method of forming a pattern on a nanometer scale comprising the steps of:
- binding to a substrate surface a self-assembled two-dimensionally ordered material array forming a two-dimensional spatial pattern of at least one of thickness, density and chemical reactivity variations, said pattern having a characteristic dimension of 1-50 nanometers,
- forming at least one overlayer on said array;
- and
- forming a two-dimension, nanometer scale pattern of holes in said overlayer which is determined by said pattern in said array.
A method of forming a pattern on a nanometer scale comprising the steps of:
- binding to a substrate surface a self-assembled two-dimensionally ordered array of nondenatured protein molecules said two dimensional array forming a two-dimensional spatial pattern of at least one of thickness, density and chemical reactivity variations, said pattern having a characteristic dimension of 1-50 nanometers;
- and
- transferring a two-dimensional nanometer scale pattern formed from said at least one of thickness, density and chemical activity variations onto said substrate.
A method of forming a pattern on a nanometer scale comprising the steps of:
- binding to a substrate surface a self-assembled two-dimensionally ordered array of nondenatured protein molecules said two dimensional array forming a two-dimensional spatial pattern of holes, said holes having a dimension of 1-50 nanometers;
- and
- applying material to an assembly of said array and said substrate to form projections in said holes bound to said substrate.
A method of forming a pattern on a nanometer scale comprising the steps of:
- binding to a substrate surface a self-assembled two-dimensionally ordered material array forming a two-dimensional spatial pattern of at least one of thickness, density,and chemical reactivity variations, said pattern having a characteristic dimension of 1-50 nanometers;
- and
- removing material from portions of said substrate corresponding, to said spatial pattern to form pits.
A method of forming a pattern on a nanometer scale comprising the steps of:
- binding to a substrate surface a self-assembled two-dimensionally ordered material array forming a two-dimensional spatial pattern of at least one of thickness, density and chemical reactivity variations, said pattern having a characteristic dimension of 1-50 nanometers;
- forming at least one overlayer on said array;
- forming a two-dimensional nanometer scale pattern ins aid overlayer, which is determined by in said array;
- and
- connecting at least one of said array and said overlayer to at least one conductive electrode.
Dependencies are inferred from the claim text.