Process for forming deposited film
AssigneeCanon Kabushiki Kaisha
InventorsShunichi Ishihara, Shigeru Ohno, Masahiro Kanai, Shunri Oda, Isamu Shimizu
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Abstract
A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing germanium and a halogen and an active species (B) formed from a chemical substance for film formation which is reactive with said active species (A) separately from each other, then providing them with discharge energy and thereby allowing both the species to react with each other thereby to form a deposited film on the substrate.
Claims23
A process for forming a deposited film comprising separately introducing an active species (A) and an active species (B) into a film forming space housing a substrate therein, said active species (A) being formed by decomposing a compound containing germanium and a halogen;
- and said active species (B) being formed by decomposing a chemical substance for film formation which is reactive with said active species (A);
- and
- applying discharge energy to both said active species (A) and active species (B) and allowing both active species (A) and active species (B) to react with each other thereby to form a deposited film on the substrate.
Dependencies are inferred from the claim text.