US 4,794,646 A · Charged beam pattern defect inspection apparatus

Abstract

A charged beam pattern defect inspection apparatus for inspecting pattern defects on materials such as masks or wafers comprising: a collecting charged beam irradiation apparatus including scanning deflection device for accelerating and focusing the scanning beam, and a detector for detecting phenomenon produced by incident particles such as reflected electrons, secondary electrons, cathodeluminescent light, X rays, or absorption currents; a scanning and synchronous signal generator for generating a scanning signal to be control the scanning deflection means and a synchronous signal to fed into an A/D converter; a two-dimensional video memory including an A/D converter and an address signal generator; a video signal operator for operating the video signal stored in the two-dimensional video memory; a stage driving apparatus for driving a stage for holding the material to be inspected, which includes a position detector for detecting the position of the stage; an auxiliary memory device for storing inspection data; and a control operation apparatus for controlling the scanning and synchronous signal generator, the two dimensional video memory, the video signal operator, the stage driving apparatus, and the auxiliary memory device, and for outputting the output of the video signal operator as the result of pattern defect inspection.

Claims10

Dependent claims

A charged beam pattern defect inspection apparatus for inspection and determination of pattern defects on materials such as masks or wafers comprising:

a collecting charged beam irradiation apparatus including,
scanning beam source means, for producing a scanning beam,
scanning deflection means, for accelerating and focusing the scanning beam, and
a detector for detecting phenomenon produced by incident particles such as reflected electrons, secondary electrons, cathodeluminescent light, X rays, or absorption currents;
a two dimensional video memory having,
an A/D converter,
a memory for storing a video signal, and
an address signal generator;
a scanning generator for generating a scanning signal to control said scanning deflection means;
a synchronous signal generator for generating a synchronous signal to be fed into said A/D converter;
a video signal operator, for performing operations upon the video signal stored in said memory and for producing an output;
a stage driving means, for driving a stage, the stage holding the material to be inspected, including a position detector for detecting the position of the stage;
an auxilliary memory device for storing inspection data;
and
a control operation means, for controlling said scanning signal generator, said synchronous signal generator, said two dimensional video memory, said video signal operator, said stage driver means, and said auxiliary memory device, and for outputting the output of said video signal operator, the output is the determination of the pattern defect inspection.

12 more elements

A pattern defect inspection apparatus for inspecting and determining pattern defects on materials such as masks or wafers comprising:

control means, for producing a deflection control signal, a video memory control signal and a stage control signal;
scan beam source means, for producing a scan beam to scan the material to be inspected;
deflection means, responsive to said control means, for accelerating and focusing the scanning beam in response to the deflection control signal;
detector means, for detecting phenomenon produced by the scan beam reflected from the material to be inspected and for producing a video signal in response to the detected phenomenon;
video memory means, operatively connected to said detection means and said control means, responsive to said control means, for digitizing the video signal and for storing the digital video signal in response to the video memory control signal;
operator means, operatively connected to said video memory means, for performing operations upon the digital video signal and for producing a result;
stage means, responsive to said control means, for holding the material to be inspected and for moving the material to a desired position in response to the stage control signal;
and
inspection data memory means, for storing inspection data;
said control means outputs the result of the operator means, the result is the determination of the pattern defect inspection.

7 more elements

Dependencies are inferred from the claim text.

Charged beam pattern defect inspection apparatus

Life of this patent

Charged beam pattern defect inspection apparatus

Life of this patent

Abstract

Claims10