Heterostructure semiconductor laser diode
AssigneeTelefunken electronic GmbH
InventorsWerner Schairer, Jochen Gerner
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AssigneeTelefunken electronic GmbH
InventorsWerner Schairer, Jochen Gerner
Estimating the term…
The invention relates to a heterostructure semiconductor laser diode with a layer sequence formed on a substrate, wherein a laser-active zone is arranged between layers of respectively opposite conductivity types, wherein an additional layer having a cover layer disposed thereon, and both of the same conductivity type as the substrate, are formed on the side of the layer sequence facing away from the substrate, and wherein a semiconductor area doped oppositely to the cover layer is produced by diffusion in the cover layer and penetrates, in a strip-shaped zone extending perpendicularly to the exit surface of the laser radiation in the area of the plane of symmetry below a v-groove-shaped recess, the boundary plane between the cover layer and the adjacent additional layer and extends into but not through the layer arranged thereunder, whereby the current flowing in the forward direction of the semiconductor laser diode is confined to a narrow strip-shaped area of the laser-active layer. The amplifying area of the laser-active is made significantly shorter in its length-wise dimensions than the resonator length of the semiconductor laser diode by the laser-active layer extending in a small area of the resonator length immediately in front of the two mirrors of the semiconductor laser diode at an incline to the main plane of the laser-active layer and by the v-groove-shaped recess being symmetrically shortened by the amount of this small area in relation to the resonator length.
In a heterostructure semiconductor laser diode having a layer sequence formed on a substrate of one conductivity type (1), with the sequence including a laser-active zone (3) disposed between upper and lower enclosing layers (2, 4) of respectively opposite conductivity types, an additional layer (5) of the same conductivity type as the substrate (1) disposed on said upper enclosing layer on the side of the layer sequence facing away from the substrate, and a cover layer of the same conductivity type as the substrate disposed on said additional layer, and with said cover layer (6) including an oppositely doped diffused semiconductor region (13) which, in a strip-shaped zone extending perpendicularly to the exit surface of the laser radiation (18) in the area of the plane of symmetry (14) of the layer sequence and below a v-groove-shaped recess (16) formed in said cover layer, penetrates said additional layer (5) and extends into the said upper enclosing layer (4) located thereunder, whereby current flowing in the forward direction of the semiconductor laser diode is confined to a narrow, stripe-shaped area (15) of the laser-active layer (3);
Dependencies are inferred from the claim text.