Molecular sieve compositions

Process for preparing the crystalline molecular sieves having three-dimensional microporous framework structures of ELO.sub.2, AlO.sub.2, PO.sub.2, SiO.sub.2 oxide units and having an empirical chemical composition on an anhydrous basis expressed by the formula:

• mR:(EL.sub.w Al.sub.x P.sub.y Si.sub.z)O.sub.2
• wherein "R" represents at least one organic templating agent present in the intracrystalline pore system;
• "m" represents the molar amount of "R" present per mole of (EL.sub.w Al.sub.x P.sub.y Si.sub.z)O.sub.2 and has a value of zero to about 0.3;
• "EL" represents at least one element capable of forming a three dimensional oxide framework, "EL" is characterized as an element having a mean "T-O" distance in tetrahedral oxide structures between about 1.51 Angstroms and about 2.06 Angstroms, "EL" has a cation electronegativity between about 125 kcal/g-atom to about 310 kcal/g-atom and "EL" is capable of forming stable M-O-P, M-O-Al or M-O-M bonds in crystalline three dimensional oxide structures having an "M-O" bond dissociation energy greater than about 59 kcal/mole at 298.degree. C.;
• and "w", "x", "y" and "z" represent the mole fractions of "EL", aluminum, phosphorus, and silicon, respectively, present as framework oxides, said mole fractions being within the pentagonal compositional area defined by points A, B, C, D and E of FIG. 1, wherein element "EL" and each of aluminum, phosphorus and silicon are present such that "w", "x", "y" and "z" are at least 0.01 and each element "EL" is present as a tetrahedral oxide unit ELO.sub.2 in an amount of at least 0.01, said crystalline molecular sieves having a characteristic X-ray powder diffraction pattern which contains at least the d-spacings set forth in one of the following Tables A and B:
• TABLE A ______________________________________ (ELAPSO-5) 2.theta. d(.ANG.) Relative Intensity ______________________________________ 7.2-7.7 12.28-11.48 m-vs 19.4-19.9 4.58-4.46 w-m 20.85-21.3 4.26-4.17 w-vs 22.1-22.6 4.02-3.93 m-vs 25.6-26.1 3.480-3.414 vw-m ______________________________________
• TABLE B ______________________________________ (ELAPSO-11) 2.theta. d(.ANG.) Relative Intensity ______________________________________ 7.8-8.2 11.19-10.85 m-s 9.0-9.8 9.83-9.03 vw-vs 12.8-13.6 6.92-6.51 vw-m 19.9-20.5 4.46-4.33 m-s 20.8-21.8 4.27-4.08 m-vs 22.0-22.6 4.04-3.93 m-vs 22.6-23.1 3.93-3.85 vw-vs 23.1-23.5 3.85-3.79 w-vs ______________________________________
• which process comprises providing a reaction mixture composition at an effective temperature and for an effective time sufficient to produce said molecular sieves, said reaction mixture composition being expressed in terms of molar oxide ratios as follows:
• aR:(EL.sub.r Al.sub.s P.sub.t Si.sub.u)O.sub.2 :bH.sub.2 O
• wherein "R" is an organic templating agent;
• "a" is the amount of "R" and is an effective amount greater than zero to about 6;
• "b" has a value of from zero to about 500;
• "EL" represents at least one element capable of forming a three-dimensional oxide, "EL" is characterized as an element having a mean "T-O" distance in tetrahedral oxide structures between about 1.51 Angstroms and about 2.06 Angstroms, "EL" has a cation electronegativity between about 125 kcal/g-atom to about 310 kcal/g-atom and "EL" is capable of forming stable M-O-P, M-O-Al or M-O-M bonds in crystalline three dimensional oxide structures having an "M-O" bond dissociation energy greater than about 59 kcal/mole at 298.degree. C.;
• and "r", "s", "t" and "u" represent mole fractions, respectively, of "EL", aluminum, phosphorus and silicon in the (EL.sub.r Al.sub.s P.sub.t Si.sub.u)O.sub.2 constituent, and each has a value of at least 0.01.

Process for preparing the crystalline molecular sieves having three-dimensional microporous framework structures of ELO.sub.2, AlO.sub.2, PO.sub.2, SiO.sub.2 oxide units and having an empirical chemical composition on an anhydrous basis expressed by the formula:

• mR:(EL.sub.w Al.sub.x P.sub.y Si.sub.z)O.sub.2
• wherein "R" represents at least one organic templating agent present in the intracrystalline pore system;
• "m" represents the molar amount of "R" present per mole of (EL.sub.w Al.sub.x P.sub.y Si.sub.z)O.sub.2 and has a value of zero to about 0.3;
• "EL" represents at least one element capable of forming a three dimensional oxide framework, "EL" is characterized as an element having a mean "T-O" distance in tetrahedral oxide structures between about 1.51 Angstroms and about 2.06 Angstroms, "EL" has a cation electronegativity between about 125 kcal/g-atom to about 310 kcal/g-atom and "EL" is capable of forming stable M-O-P, M-O-Al or M-O-M bonds in crystalline three dimensional oxide structures having an "M-O" bond dissociation energy greater than about 59 kcal/mole at 298.degree. C.;
• and "w", "x", "y" and "z" represent the mole fractions of "EL", aluminum, phosphorus, and silicon, respectively, present as framework oxides, said mole fractions being within the pentagonal compositional area defined by points A, B, C, D and E of FIG. 1, wherein element "EL" and each of aluminum, phosphorus and silicon are present such that "w", "x", "y" and "z" are at least 0.01 and each element "EL" is present as a tetrahedral oxide unit ELO.sub.2 in an amount of at least 0.01, which process comprises providing a reaction mixture composition at an effective temperature and for an effective time sufficient to produce said molecular sieves, said reaction mixture composition being expressed in terms of molar oxide ratios as follows:
• aR:(EL.sub.r Al.sub.s P.sub.t Si.sub.u)O.sub.2 :bH.sub.2 O
• wherein "R" is an organic templating agent;
• "a" is the amount of "R" and is an effective amount greater than zero to about 6;
• "b" has a value of from zero to about 500;
• "EL" represents at least one element capable of forming a three-dimensional oxide, "EL" is characterized as an element having a mean "T-O" distance in tetrahedral oxide structures between about 1.51 Angstroms and about 2.06 Angstroms, "EL" has a cation electronegativity between about 125 kcal/g-atom to about 310 kcal/g-atom and "EL" is capable of forming stable M-O-P, M-O-Al or M-O-M bonds in crystalline three dimensional oxide structures having an "M-O" bond dissociation energy greater than about 59 kcal/mole at 298.degree. C.;
• and "r", "s", "t" and "u" represent mole fractions, respectively, of "EL", aluminum, phosphorus and silicon in the (EL.sub.r Al.sub.s P.sub.t Si.sub.u)O.sub.2 constituent, and each has a value of at least 0.01.