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AssigneesRicoh Company, Ltd., Ricoh Research Institute of General Electronics Co., Ltd.
InventorsMasafumi Kumano, Yasuyuki Shindoh, Yutaka Sano, Koichi Haga, Akihiro Fuse
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This invention relates to a photosensitive material for electrophotography having, on a substrate, an amorphous silicon layer comprising silicon atom as the matrix and containing at least one of hydrogen atom, halogen atom and heavy hydrogen atom, characterized by provided with a porous aluminum oxide layer between said substrate and said amorphous silicon layer. This invention further relates to a photosensitive material for electrophotography having, on a substrate, an amorphous silicon layer comprising silicon atom as the matrix and containing at least one of hydrogen atom, halogen atom and heavy hydrogen atom, characterized by provided with a porous aluminum oxide layer having the surface treated with a silicide material between said substrate and said amorphous silicon layer.
A photosensitive material for electrophotography having, on a substrate, an amorphous silicon layer comprising silicon atoms as the matrix and containing at least one of hydrogen atoms, halogen atoms and heavy hydrogen atoms, and being characterized by being provided with a porous aluminum oxide layer positioned between said substrate and said amorphous silicon layer, said porous aluminum oxide layer having its surface treated with a silicide material.
Dependencies are inferred from the claim text.