Method of removing organic impurities from aqueous solution of hydrogen peroxide
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsShizuo Togo, Yasuo Sugihara, Takaki Ikebe
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Abstract
A method of removing organic impurities from an aqueous solution of hydrogen peroxide, which comprises bringing an aqueous solution of hydrogen peroxide containing organic impurities into contact with a halogen-containing porous resin having a true specific gravity in the wet state of 1.1 to 1.3.
Claims8
A method of removing organic impurities from an aqueous solution of hydrogen peroxide, which comprises bringing an aqueous solution of hydrogen peroxide containing organic impurities into contact with a halogen-containing porous resin having a true specific gravity in the wet state of 1.1 to 1.3.
Dependencies are inferred from the claim text.