Integrated capacitance structures in microwave finline devices
AssigneeHewlett-Packard Company
InventorRobert D. Albin
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AssigneeHewlett-Packard Company
InventorRobert D. Albin
Estimating the term…
A finline structure comprises a dielectric substrate-mounted circuit disposed within a waveguide having on the substrate integrated distributed capacitance elements at least partially formed by laterally separated metallization layers. Thin-film construction techniques may be employed in construction. In general, the distributed capacitance elements permit the biasing of a plurality of circuit elements in a finline transmission medium. In selected structures, r.f. continuity is effected between traces and metallization layers while maintaining d.c. isolation. Examples are described of circuits which can incorporate an integrated capacitor, including but not limited to detectors, r.f. modulators, r.f. attenuators, amplifiers, and multipliers. According to the invention, a plurality of elements, as well as multiple port elements, may be selectively biased while retaining d.c. isolation and r.f. continuity. Moreover, the versatility of construction allows for higher levels of integration as well as the realization of new topologies previously unattainable. Since the capacitance structure is integrated into the thin film circuit, fewer discrete parts are required and the manufacturing process may be precisely controlled by photolithography.
In an apparatus for processing microwave energy in a waveguide, said apparatus including a dielectric substrate disposed within said waveguide and extending between opposing first and second interior walls of said waveguide, said dielectric substrate having thereon metallization on a first substantially planar surface, said metallization including at least a first metallization layer forming a first margin on a first side of a channel region of exposed dielectric surface, a second metallization layer forming a second margin on a second side of said channel region opposing said first margin, the improvement comprising:
An apparatus for detecting microwave energy in a waveguide, said apparatus including a dielectric substrate disposed within said waveguide and extending between opposing first and second interior walls of said waveguide, said dielectric substrate having thereon metallization on a first substantially planar surface, said metallization defining at least a detection region upon said first surface, said metallization defining a gap of exposed dielectric surface between opposing margins of metallization, said metallization further forming an input transition region of said dielectric surface, the improvement wherein:
An apparatus for detecting microwave energy in a waveguide, said apparatus including a dielectric substrate disposed within said waveguide and extending between opposing first and second interior walls of said waveguide, said dielectric substrate having thereon metallization on a first substantially planar surface, said metallization defining at least a detection region upon said first surface, said metallization defining a gap of exposed dielectric surface between opposing margins of metallization, said metallization further forming an input transition region of said dielectric surface, the improvement wherein:
An apparatus for detecting microwave energy in a waveguide, said apparatus including a dielectric substrate disposed within said waveguide and extending between opposing first and second interior walls of said waveguide, said dielectric substrate having thereon metallization on a first substantially planar surface, said metallization defining at least a detection region upon said first surface, said metallization defining a gap of exposed dielectric surface between opposing margins of metallization, said metallization further forming an input transition region of said dielectric surface, the improvement wherein:
Dependencies are inferred from the claim text.