Method of manufacturing a heterojunction bipolar transistor involving etch and refill
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorYasutomo Kajikawa
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Abstract
A heterojunction bipolar transistor and method of manufacturing the same is disclosed in which, a semi-insulation layer and an external base layer sequentially epitaxially grown on a collector layer are selectively mesa-etched through a mask of an insulation film provided with an opening so that the external base layer, the semi-insulation layer and the collector layer are selectively exposed. Subsequently an internal base layer and an emitter layer are selectively epitaxially grown in sequence on the exposed regions of the external base layer, the semi-insulation layer and the collector layer. An emitter electrode is formed in a self-aligned manner through the opening of the insulation film. Thus, transistor performance is improved and element size accuracy is improved.
Claims5
A method of manufacturing a heterojunction bipolar transistor, said method comprising:
- a first step of sequentially epitaxially growing a first conductivity type collector layer, a semi-insulating layer and a second conductivity type external base layer on the upper part of a semi-insulating substrate;
- a second step of performing selective mesa etching from said external base layer to said collector layer by utilizing a insulation film having a selectively formed opening as a mask to form a cavity exposing said external base layer, said semi-insulating layer and said collector layer;
- a third step of sequentially epitaxially growing a second conductivity type internal base layer and a first conductivity type emitter layer in said cavity by utilizing said insulation film as a mask;
- and
- a fourth step of forming an emitter electrode in a self-aligned manner through said opening of said insulation film.
Dependencies are inferred from the claim text.