Specimen distance measuring system
AssigneeThe Perkin-Elmer Corporation
InventorsWilliam A. Eckes, Lee Veneklasen, Glen E. Howard, Donald J. McCarthy, Allen M. Carroll, Daniel L. Cavan
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AssigneeThe Perkin-Elmer Corporation
InventorsWilliam A. Eckes, Lee Veneklasen, Glen E. Howard, Donald J. McCarthy, Allen M. Carroll, Daniel L. Cavan
Estimating the term…
A specimen distance measuring system uses a plate (36) to obstruct the flux of backscattered electrons produced by an electron beam (18), and to cast a shadow across a measurement detector (32) which is sensitive to the position of the shadow. The shadow plate (36) and measurement detector (32) are aligned at an angle of approximately 45 degrees with a substrate (14) in order to allow calibration of the distance measuring system by scanning the electron beam (18). The measuring system is particularly useful as a height sensor (10) in an electron beam lithography apparatus (12) for sensing the height of a substrate (14). The distance measuring system may also include a reference detector (34) which is positioned in order to receive backscattered electron flux without obstruction from the shadow plate (36). The use of such a reference detector (32) is advantageous in allowing compensation of the signals obtained by the measurement detector, in order to allow the height sensor to operate independently of variations in electron beam current, and variations in substrate backscatter coefficient. The reference and measurement detectors (34,32) may be aligned in a vertical or horizontal plane to be either parallel to or perpendicular to the bombardment electron beam (18). Active feedback may be provided from the height sensor (10) to a vertical stage actuator for adjusting the height of the substrate (14).
A sensor for use in determining the position of a substrate which is bombarded by a beam from a source of charged particles, wherein charged particles are backscattered from said substrate, said sensor comprising:
An electron beam exposure system having a substrate holder for holding a substrate, an electron beam source for projecting an electron beam onto the substrate, and further comprising:
An electron beam exposure system having a movable stage for holding a substrate thereon, an electron beam source for projecting an electron beam onto the substrate, and further comprising;
An electron beam exposure system having a substrate holder for holding a substrate thereon, a focusable electron beam source for projecting an electron beam onto the substrate with the focus of the beam being responsive to a beam focusing electronic signal, and further comprising;
Dependencies are inferred from the claim text.