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US 4,788,416 AGranted
Direct wafer temperature control
AssigneeSpectrum CVD, Inc.
InventorsJ. B. Price, Richard S. Rosler
Life of this patent
Estimating the term…
Abstract
The temperature of a wafer in a vacuum chamber is measured by way of a tube, containing a thermocouple, extending through a wall of the chamber. The tube is sealed at one end to an aperture in the wall of the system and sealed at the other end with removable sealant.
Claims8
In apparatus for treating a semiconductor wafer in a vacuum, said apparatus having a chamber including a translucent window on which the wafer rests and including means for heating said wafer through the translucent window, the improvement comprising:
- an aperture in said window at a location on which said wafer rests;
- a translucent tube attached and sealed to said window at said aperture on the outside of said chamber;
- temperature sensing means extending through said tube and said aperture to touch the surface of said wafer in contact with said window;
- and
- means for sealing the end of said tube remote from said window.
2 more elements
Dependencies are inferred from the claim text.