Thin-film strain gauge system and method of manufacturing same
AssigneeU.S. Philips Corporation
InventorsUdo Bringmann, Olaf H. Dossel, Klaus W. Gerstenberg, Gerhard Kursten, Reiner U. Orlowski, Detlef G. Schon
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Abstract
Thin film strain gauge system consisting of an elastically deformable flexible metallic substrate on which an electrically insulating layer of a plasma-polymerized material, in particular of Si:N:O:C:H-containing compounds and thereon a structured resistance layer as well as an electrically readily conducting layer having a structure for the electrical contacting are provided.
Claims16
A thin-film strain gauge system comprising an elastically deformable flexible substrate, an insulating layer present on a surface of said substrate, a resistance layer on the surface of said insulating layer away from said substrate and a patterned electrically conductive layer on the surface of said resistance layer characterized in that the insulating layer consists of a plasma polymerized material.
A method of manufacturing a thin-film strain gauge system comprising:
- (a) providing an electrically insulating layer of a plasma-polymerized material on an elastically deformable, flexible, substrate by deposition from a gaseous phase which phase comprises a plasma-polymerizable material;
- (b) providing a resistance layer on said electrically insulating layer,
- (c) structuring said resistance layer to form at least one resistance path and
- (d) forming thin layer electrical connections on said structured resistance layer.
Dependencies are inferred from the claim text.