Apparatus for measuring photoelasticity
AssigneeHitachi, Ltd.
InventorsMasaki Yoshii, Shigeo Tohyama, Aizo Kaneda
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AssigneeHitachi, Ltd.
InventorsMasaki Yoshii, Shigeo Tohyama, Aizo Kaneda
Estimating the term…
An apparatus for measuring photoelasticity permitting to control mechanical stress applied to an elastic body, by visualizing phase differences of polarized light transmitted by the elastic body is disclosed. In such a prior art apparatus a quarter wavelength plate was used in order to obtain circularly polarized light. However, the precision of the circularly polarized light is worsened, when it works in a wide wavelength region. To the contrary, in an apparatus according to this invention, circularly polarized light is obtained by means of Fresnel's rhombic body. As the result good circularly polarized light can be obtained for a wide wavelength region from the visible region to the near infrared region and control of products including thin films and semiconductor substrates can be effected by visualizing mechanical stress therein.
Apparatus for measuring photoelasticity comprising:
Apparatus for measuring photoelasticity comprising:
Dependencies are inferred from the claim text.