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US 4,786,358 AGranted
Method for forming a pattern of a film on a substrate with a laser beam
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsShunpei Yamazaki, Akira Mase, Hiroyuki Sakayori
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Abstract
An improved method for forming a pattern on a substrate coated with a film is shown. The substrate is irradiated with a laser beam which is shaped through a mask, and a portion of the film is removed by the energy of the laser beam to produce the desired pattern. The laser beam is emitted from an exmer laser.
Claims15
A method for forming a pattern of a film provided on a substrate, said method comprising the steps of:
- generating a laser beam from an eximer laser;
- expanding said laser beam by an expander;
- contracting said expanded laser beam through a convex lense;
- shaping said contracted laser beam through a mask;
- and
- irradiating said film with said shaped laser beam to remove selected portion of said film.
3 more elements
A method for forming a pattern of a film provided on a substrate, said method comprising the steps of:
- generating a laser beam from an eximer laser;
- expanding said laser beam by an expander;
- shaping said contracted laser beam through a mask;
- contracting said expanded laser beam through a convex lense;
- shaping said contracted laser beam through a mask;
- and
- irradiating said film with said shaped laser beam to remove selected portion of said film.
4 more elements
Dependencies are inferred from the claim text.