Alignment device
AssigneeCanon Kabushiki Kaisha
InventorsTakao Kariya, Susumu Goto, Masahiko Okunuki
Life of this patent
Estimating the term…
Abstract
An alignment device including an electron gun for emitting an electron beam, a deflecting electrode for scanningly deflecting the electron beam emitted from the electron gun, a holder for holding an object in a plane of scan, a reference mark with which the object is to be aligned, and a detector for detecting electron beams emerging from the reference mark and the object, which are irradiated by the scanning electron beam, to detect the position of each of the reference mark and the object. On the basis of result of detection by the detector, the object is displaced by a drive source, whereby it is precisely aligned with the reference mark.
Claims6
An alignment device comprising:
- a reference having a reference mark for use in the alignment of an object:
- means incluidng an electron beam for scanning said reference mark and an alighment mark provided on the object;
- means for detecting electrons from said reference mark and from the alignment mark scanned with the electron beam;
- and
- means for moving the object relative to the reference on the basis of the electron detection performed by said detecting means.
A device for aligning a first object and a second object with each other, said device comprising:
- reference means having a first reference mark and a second reference mark for the use in the alignment of the first and second objects;
- first scanning means including an electron beam for scanning said first reference mark and the first object;
- second scanning means including an electron beam for scanning said second reference mark and the second object;
- means for detecting electrons from the first and second objects and from said first and second reference marks;
- and
- means for moving at least one of the first and second objects on the basis of the electron detection performed by said detecting means so as to relatively align the first and second objects.
A device for aligning a mask having a pattern with a wafer onto which the pattern of the mask is to be transferred, said device comprising:
- first reference means having a first reference mark for use in the alignment of the mask;
- second reference means having a second reference mark for use in the alignment of the wafer, said second reference means located in a substantially fixed position relative to the first reference means;
- first scanning means including an electron beam for scanning said first reference mark and the mask;
- second scanning means including an electron beam for scanning said second reference mark and the wafer;
- means for detecting electrons from the mask and the wafer and from said first and second reference marks;
- and
- means for moving at least one of the mask and the wafer on the basis of the electron detection performed by said detecting means so as to relatively align the mask and wafer.
Dependencies are inferred from the claim text.