Process for forming deposited film
AssigneeCanon Kabushiki Kaisha
InventorsShunichi Ishihara, Shigeru Ohno, Masahiro Kanai, Shunri Oda, Isamu Shimizu
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Abstract
A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing carbon and halogen and an active species (B) formed from a chemical substance for film formation which is chemically mutually reactive with said active species (A) separately from each other, then providing them with heat energy and thereby allowing both the species to react chemically with each other to form a deposited film on the substrate.
Claims23
A process for forming a deposited film comprising separately introducing an active species (A) and an active species (B) into a film forming space housing a substrate therein, said active species (A) being formed by decomposing a compound containing carbon and a halogen;
- and said active species (B) being formed from a chemical substance for film formation which is chemically mutually reactive with said active species (A);
- and
- applying heat energy to said active species (A) and active species (B) and allowing both active species (A) and active species (B) to react chemically with each other to form a deposited film on the substrate.
Dependencies are inferred from the claim text.