Process for making an implantable device having plasma sprayed metallic porous surface
AssigneeCordis Corporation
InventorPaul J. Szilagyi
Life of this patent
Estimating the term…
Abstract
An implantable device, appliance or component thereof is provided which includes a porous coating of elemental metal, which porous coating is prepared by subjecting a blend of elemental metal powder and a reductive gas atmosphere to plasma deposition conditions and spraying same onto the device, appliance or component onto which the porous coating is thereby formed.
Claims13
A device or appliance that is implantable in organic tissue and that has a surface for enhancing organic tissue ingrowth thereinto, the device or appliance having been made by a process comprising:
- providing a shaped substrate member having an electrically conductive surface;
- blending a supply of electrically conductive elemental metal particles with a reductive gaseous environment in order to form a plasma deposition blend, said reductive gaseous environment including a reductive gas that substantially eliminates oxidation of the elemental metal particles during their subsequent plasma deposition within said reductive gaseous environment;
- subjecting said plasma deposition blend to a source of energy in order to plasma excite said plasma deposition blend within said reductive gaseous environment;
- spraying said excited plasma deposition blend onto said electrically conductive surface of the shaped substrate member within said reductive gaseous environment in order to thereby form a porous coating of substantially unoxidized elemental metal and pores onto said electrically conductive surface of the shaped substrate member;
- and
- said steps of subjecting said plasma deposition blend to a source of energy in order to plasma excite it and spraying said excited plasma deposition blend onto said electrically conductive surface raise the temperature of the electrically conductive surface to a temperature significantly lower than a metal sintering temperature.
A process for making a porous component of a device or appliance that is implantable in organic tissue, the porous component having a surface for enhancing organic tissue ingrowth thereinto, comprising:
- providing a shaped substrate member having an electrically conductive surface;
- blending a supply of electrically conductive elemental metal particles with a reductive gaseous environment in order to form a plasma deposition blend, said reductive gaseous environment including a reductive gas that substantially eliminates oxidation of the elemental metal particles during their subsequent plasma deposition within said reductive gaseous environment;
- subjecting said plasma deposition blend to a source of energy in order to plasma excite said plasma deposition blend within said reductive gaseous environment;
- spraying said excited plasma deposition blend onto said electrically conductive surface of the shaped substrate member within said reductive gaseous environment in order to thereby form a porous coating of substantially unoxidized elemental metal and pores onto said electrically conductive surface of the shaped substrate member;
- and
- said steps of subjecting said plasma deposition blend to a source of energy in order to plasma excite it and spraying said excited plasma deposition blend onto said electrically conductive surface raise the temperature of the electrically conductive surface to a temperature significantly lower than a metal sintering temperature.
Dependencies are inferred from the claim text.