Novel electron beam resist materials
AssigneeNippon Oil Co., Ltd.
InventorsShozo Tsuchiya, Nobuo Aoki
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Abstract
Positive acting electron beam resist materials are described. The material comprises a polymer having fundamental units of the general formula ##STR1## in which R.sub.1, R.sub.2 and R.sub.3 independently represent hydrogen or a hydrocarbon group having from 1 to 6 carbon atoms, and R.sub.4 represents an organic residue having from 1 to 20 carbon atoms. The polymer may be used, as the resist material, as it is or by mixing with other type of resin.
Claims3
A positive active electron beam resist material which comprises a silicon wafer and a polymer having a number average molecular weight of from 10,000 to 1,000,000 and having, in the molecule thereof, repeating fundamental units of formula ##STR33## wherein each of R.sub.1, R.sub.2 and R.sub.3 is hydrogen or a hydrocarbon radical having from 1 to 6 carbon atoms, and R.sub.4 is (a) a partially or completely fluorinated hydrocarbon radical having from 1 to 20 carbon atoms;
- (b) a --OR.sub.5 group wherein R.sub.5 is a partially or completely fluorinated hydrocarbon radical having from 1 to 8 carbon atoms;
- (c) a ##STR34## group wherein R.sub.5 has the same meaning as defined above;
- or (d) a ##STR35## group wherein R.sub.5 has the same meaning as defined above.
Dependencies are inferred from the claim text.