Apparatus for removing covering film
AssigneesResearch Development Corporation of Japan, Vacuum Metallurgical Co., Ltd.
InventorChikara Hayashi
Life of this patent
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Abstract
An apparatus for removing a photo-resist covering from a substrate employs fine solid CO.sub.2 particles that are impacted on the substrate at high velocity to cause abrading of the photo-resist covering in the absence of damage or contamination of the substrate.
Claims8
An apparatus for removing a photo resist covering film by blowing fine solid CO.sub.2 particles against a covering film applied to a surface of a substrate, including a jet nozzle directly connected through a connecting pipe to a bomb containing liquefied carbonic acid gas and arranged to be directed toward a substrate having thereon a photo resist covering film to be removed, said jet nozzle providing for the conversion of said liquified carbonic acid gas into a high velocity stream of said fine solid CO.sub.2 particles.
An apparatus for removing a photo resist covering film by blowing fine solid CO.sub.2 particles mixed with fine ice particles against a covering film applied to a surface of a substrate, including a jet nozzle which is directly connected through a connecting pipe to a bomb containing liquefied carbonic acid gas and arranged to be directed toward a substrate having thereon a photo resist covering film to be removed, said jet nozzle providing for the conversion of said liquefied carbonic acid gas into a high velocity stream of said fine CO.sub.2 particles for subsequent admixture with said fine ice particles.
Dependencies are inferred from the claim text.