Gas pressure gage
AssigneeSeiko Instruments Inc.
InventorHisao Hojoh
Life of this patent
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Abstract
Regarding a gas pressure gage for measuring a gas pressure in a vacuum chamber of a semiconductor element manufacturing apparatus, or the like, the present invention has made it possible to attain a small-sized and unitary gas pressure gage and to implement a thorough measurement of gas pressure from the atmospheric pressure to a high vacuum of about 10.sup.-10 Torr, by mounting both a mechanical vibrator type pressure gage and an ionization type pressure gage on a flange provided for fitting a chamber and by providing a control circuit for making the former gage operate in a low-vacuum region and the latter in a high-vacuum region.
Claims3
A gas pressure gage wherein a pressure gage using a mechanical vibrator driven by an electric field or a magnetic field and an ionization-type pressure gage are incorporated in a common flange and which is provided with a control circuit for making the pressure gage using the mechanical vibrator operate in a low-vacuum region and the ionization-type pressure gage in a highvacuum region.
Dependencies are inferred from the claim text.