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AssigneeInternational Business Machines Corporation
InventorsDouglas G. Cullum, George J. Giuffre, Timothy R. Groves, Werner Stickel, Maris A. Sturans
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An electrostatic deflection plate for charged particle beam systems is formed of a planar semiconductive substrate having a conductive region at the substrate surface. The conductive region is diffused or implanted into the body of the substrate, or one or more conductive layers are deposited upon the substrate surface. The substrate material is preferably silicon and the diffused or implanted region is formed of a nonmagnetic, nonoxidizable metal such as gold or platinum. The deposited conductive region may be formed of a single layer of these or similar metals, one or more conductive underlayers with a nonmagnetic, nonoxidizable overlayer, a single or multilayer structure with a conductive oxide on the outermost layer, or a metallo-organic compound which forms a conductive layer during following heat treatment. The deflection plates are fabricated using conventional semiconductor processes and form durable structures which minimize eddy current effects.
An electrostatic deflection system for a beam of charged particles comprising:
The electrostatic deflection device of claim 3 wherein:
An electrostatic deflection system for a beam of charged particles comprising:
An electrostatic deflection system for a beam of charged particles comprising:
An electrostatic deflection system in accordance with claim 11 wherein
Dependencies are inferred from the claim text.