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US 4,735,820 AGranted
Removal of residual catalyst from a dielectric substrate
AssigneeInternational Business Machines Corporation
InventorsPeter A. Agostino, Suryadevara V. Babu, Joseph G. Hoffarth
Life of this patent
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Abstract
Residual catalyst is removed from a dielectric substrate by exposing the substrate to a plasma formed from an inert gas.
Claims12
A process for the removal of residual catalyst from a dielectric substrate which comprises exposing said substrate to a plasma formed from an inert gas.
Dependencies are inferred from the claim text.