Method for projecting and exposing a photomask pattern onto re-exposing substrates and its apparatus

An apparatus for projecting an optical image of a photomask pattern of a master mask onto and thereby exposing a re-exposing substrate and using, for alignment purposes, first positioning markers marked on said master mask and second positioning markers marked on said master mask and second positioning markers marked on a standard marker substrate, said first positioning markers being arranged with a predetermined pitch on said master mask in association with said photomask pattern and said second positioning markers being arranged with the same predetermined pitch, said apparatus comprising:

• a frame;
• light beam emitting means secured to said frame and emitting a light beam along a predetermined direction;
• optical condensing means having an optical axis and secured to said frame with the optical axis in alignment with the predetermined direction of, and to receive, the light beam, said optical condensing means comprising first and second optical condensing means having a common optical axis and coupled together at an optical relaying node of the common axis;
• a carriage;
• means for mounting said carriage for movement relatively to said frame and for mounting to said carriage, for common movement therewith, said master mask, said re-exposing substrate, and said standard marker substrate, said master mask and said standard marker substrate being positioned at the conjugate planes of the optical condensing means comprising said first and second optical condensing means, and said standard marker substrate being positioned at the optical relaying node of said optical condensing means, intermediate said first optical condensing means and said second optical condensing means, and said second optical condensing means being located along the optical axis intermediate said standard marker substrate and said re-exposing substrate;
• said mounting means further comprising means for aligning said carriage for movement in a direction perpendicular to the predetermined direction of the light beam and of the corresponding optical axis of the optical condensing means and for aligning said master mask and said re-exposing substrate to be perpendicular to the light beam and the corresponding optical axis of optical condensing means during movement of said carriage and of said master mask and said re-exposing substrate therewith and for aligning said standard marker substrate with re-exposing substrate;
• means for moving said carriage to cause scanning of said master mask and of said standard marker substrate for projecting an optical image of the photomask pattern of said master mask onto said re-exposing substrate, for exposing same, and for projecting an optical image of the first positioning markers of said master mask and a shadow image of said second positioning markers of said standard marker substrate on said re-exposing substrate;
• and
• alignment scope means secured to said frame for observing, by reflected light, the images of the first and second positioning markers projected on said re-exposing substrate, during the aforesaid optical scanning,for inspecting the alignment and for monitoring the minimization of deviation between the first and second positioning markers during adjustment of the alignment by the means for aligning.