Electroluminescent panel comprising a layer of silicon between a transparent electrode and a dielectric layer and a method of making the same

Abstract

In an electroluminescent panel comprising a transparent electrode, a back electrode, an electroluminescent layer between the transparent and the back electrodes, and a dielectric layer between the transparent electrode and the electroluminescent layer, an intermediate layer consisting of silicon is interposed between the transparent electrode and the dielectric layer. The silicon layer may have a thickness between 10 angstroms and 200 angstroms. The silicon layer may be deposited on the transparent electrode by the use of a selected one of sputtering, vacuum evaporation, chemical vapor deposition, and ion plating techniques.

Dependencies are inferred from the claim text.