Inversely processed resistance heater

Abstract

A unique inverse processed film resistance heater structure including a conventional passivation wear layer which is deposited directly on a first substrate. This deposition step is then followed by the deposition and patterning of resistance and conductive layers, and these layers are covered by an isolation layer and a thick support layer. The thick support layer is then bonded to a second substrate and the first substrate is removed so that a uniform, flat passivation layer is exposed. The result is a film resistor which has a reduced failure rate as compared to the prior art because it is covered by a planar passivation wear layer with fewer pin-holes and reduced stress.

Dependencies are inferred from the claim text.