Novel organometallic polymers

Abstract

Homopolymers or copolymers of organometallic, end-capped polyphthalaldehydes containing the repeating unit of formula I ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are each independently of the other hydrogen, halogen, cyano, nitro, carboxyl, hydroxyl, C.sub.1 -C.sub.4 alkoxy, C.sub.1 -C.sub.4 alkylthio or C.sub.1 -C.sub.4 alkoxycarbonyl, and at least one of the substituents R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are a group --Q(R.sup.5).sub.3 or --Q(R.sup.6).sub.3, where Q is Si, Sn, Ge, CH.sub.2 --Si or O--Si, R.sup.5 is C.sub.1 -C.sub.12 alkyl and R.sup.6 is C.sub.6 -C.sub.10 aryl, are suitable for producing dry-developed, plasma-resistant photoresists required for the production of structured images, especially for microelectronics.

Dependencies are inferred from the claim text.